Expanding the Nanolithography Toolbox with Thermal Scanning Probe Lithography

Talks from 1pm

Short introduction to Royce Cambridge open access facilities and funding - Dr Andrew Dobrzanski.

Followed by a talk from Vasilis Theofylaktopoulos, Business Development Manager from Heidelberg Instruments and a remote demonstration of the Nano AG.

Finish with a Q&A session and an optional tour of Royce equipment in the Maxwell Centre.

Summary

E-beam and focused ion beam are the most common methods for achieving nanometer resolution patterning in research. They each come with their strengths and weaknesses. Join us to learn about Thermal Scanning Probe Lithography(tSPL). This method relies on a heated cantilever to sublimate the resist with sub 15 nm resolution. It allows for grayscale patterning and read-write capabilities. You can perform tSPL with the NanoFrazor and focus on your research in 2D materials, optics and photonics or biosensing.